A Study of the curvature of a thick AlN film grown on a trench-patterned α-Al2O3 template using X-ray diffraction

Tóm tắt

In this article, a method using X-ray diffraction for determining the crystallographic curvature of a thick AlN crystalline film epitaxially grown on a periodically trench-patterned α-Al2O3 template by the hydride vapor phase epitaxy method was studied. A series of X-ray rocking curve measurements for AlN 0002 reflection was taken at different positions across the surface of the thick AlN epitaxial film along the [1-100] direction. The authors introduce a model for determining the crystallographic curvature and the curvature radius from X-ray diffraction results. The results clearly demonstrate that the crystallographic curvature of the film is convex along the [1-100] direction and the radius of crystallographic curvature of the thick AlN film is estimated to be 3.1 m.